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1-3 of 3
Keywords: chemical mechanical polishing
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Journal Articles
Publisher: ASME
Article Type: Research-Article
J. Manuf. Sci. Eng. August 2013, 135(4): 041006.
Paper No: MANU-11-1369
Published Online: July 17, 2013
..., 2013; published online July 17, 2013. Assoc. Editor: Allen Y. Yi. 21 11 2011 17 01 2013 This study investigates chemical-mechanical polishing slurries for finishing CVD diamond films. The chemical-mechanical polishing is used in combination with the traditional mechanical polishing...
Journal Articles
Publisher: ASME
Article Type: Technical Papers
J. Manuf. Sci. Eng. August 2005, 127(3): 545–554.
Published Online: October 12, 2004
... , “ Material removal mechanism in chemical mechanical polishing: Theory and modeling ,” IEEE Trans. Semicond. Manuf. 0894-6507 10.1109/66.920723 , 14 , No. 2 , pp. 112 – 133 . Fu , G. , Chandra , A. , Guha , S. , and Subhash , G. , 2001 , A plasticity based model of material...
Journal Articles
Publisher: ASME
Article Type: Technical Papers
J. Manuf. Sci. Eng. November 2003, 125(4): 731–735.
Published Online: November 11, 2003
... predictions. The insights gained from this exercise may be used to develop a mechanistic model of material removal in chemical mechanical polishing (CMP) of ductile materials. Precision finishing is becoming an integral processing step in multilevel metallization designs for integrated circuit (IC...
