An experimental study is undertaken to investigate the flow structure and heat transfer in a stagnation flow chemical vapor deposition (CVD) reactor at atmospheric pressure. It is critical to develop models that predict flow patterns in such a reactor to achieve uniform deposition across the substrate. Free convection can negatively affect the gas flow as cold inlet gas impinges on the heated substrate, leading to vortices and disturbances in the normal flow path. This experimental research will be used to understand the buoyancy-induced and momentum driven flow structure encountered in an impinging jet CVD reactor. Investigations are conducted for various operating and design parameters. A modified stagnation flow reactor is built where the height between the inlet and substrate is reduced when compared with a prototypical stagnation flow reactor. By operating such a reactor at certain Reynolds and Grashof numbers, it is feasible to sustain smooth and vortex free flow at atmospheric pressure. The modified stagnation flow reactor is compared with other stagnation flow geometries with either a varied inlet length or varied heights between the inlet and substrate. Comparisons are made to understand the impact of such geometric changes on the flow structure and the thermal boundary layer. In addition, heat transfer correlations are obtained for the substrate temperature. Overall, the results obtained provide guidelines for curbing the effects of buoyancy and for improving the flow field to obtain greater film uniformity when operating a stagnation flow CVD reactor at atmospheric pressure.

1.
Hintermann
,
H. E.
, 1996, “
Advances and Development in CVD Technology
,”
Mater. Sci. Eng., A
0921-5093,
209
(
1–2
), pp.
366
371
.
2.
Fotiadis
,
D. I.
,
Kremer
,
A. M.
, and
McKenna
,
D. R.
, 1987, “
Complex Flow Phenomena in Vertical MOCVD Reactors: Effects on Deposition Uniformity and Interface Abruptness
,”
J. Cryst. Growth
0022-0248,
85
, pp.
154
164
.
3.
Fotiadis
,
D. I.
,
Boekholt
,
M.
, and
Jensen
,
K. F.
, 1990, “
Flow and Heat Transfer in CVD Reactors: Comparison of Raman Temperature Measurements and Finite Element Model Predictions
,”
J. Cryst. Growth
0022-0248,
100
, pp.
577
599
.
4.
Chiu
,
W. K. S.
, and
Jaluria
,
Y.
, 1999, “
Effect of Buoyancy, Susceptor Motion, and Conjugate Transport in Chemical Vapor Deposition Systems
,”
ASME J. Heat Transfer
0022-1481,
121
(
3
), pp.
757
761
.
5.
Mahajan
,
R. L.
, 1996, “
Transport Phenomena in Chemical Vapor-Deposition Systems
,”
Adv. Heat Transfer
0065-2717,
28
, pp.
339
425
.
6.
Vanka
,
S. P.
,
Luo
,
G.
, and
Glumac
,
N. G.
, 2004, “
Numerical Study of Mixed Convection Flow in an Impinging Jet CVD Reactor for Atmospheric Pressure Deposition of Thin Films
,”
ASME J. Heat Transfer
0022-1481,
126
(
5
), pp.
764
775
.
7.
Luo
,
G.
,
Vanka
,
S. P.
, and
Glumac
,
N.
, 2004, “
Fluid Flow and Transport Processes in a Large Area Atmospheric Pressure Stagnation Flow CVD Reactor for Deposition of Thin Films
,”
Int. J. Heat Mass Transfer
0017-9310,
47
(
23
), pp.
4979
4994
.
8.
Lin
,
P. T.
,
Jaluria
,
Y.
, and
Gea
,
H. C.
, 2009, “
Parametric Modeling and Optimization of Chemical Vapor Deposition Process
,”
ASME J. Manuf. Sci. Eng.
1087-1357,
131
, p.
011011
.
9.
Cho
,
W. K.
,
Choi
,
D. H.
, and
Kim
,
M.
, 1999, “
Optimization of the Inlet Velocity Profile for Uniform Epitaxial Growth in a Vertical Metalorganic Chemical Vapor Deposition Reactor
,”
Int. J. Heat Mass Transfer
0017-9310,
42
(
22
), pp.
4143
4152
.
10.
Chiu
,
W. K. S.
,
Richards
,
C. J.
, and
Jaluria
,
Y.
, 2000, “
Flow Structure and Heat Transfer in a Horizontal Converging Channel Heated From Below
,”
Phys. Fluids
1070-6631,
12
, p.
2128
.
11.
Mathews
,
A. G.
, and
Peterson
,
J. E.
, 2002, “
Flow Visualizations and Transient Temperature Measurements in an Axisymmetric Impinging Jet Rapid Thermal Chemical Vapor Deposition Reactor
,”
ASME J. Heat Transfer
0022-1481,
124
(
3
), pp.
564
570
.
12.
Wang
,
C. A.
,
Groves
,
S. H.
, and
Palmateer
,
S. C.
, 1986, “
Flow Visualization Studies for Optimization of OMVPE Reactor Design
,”
J. Cryst. Growth
0022-0248,
77
(
1–3
), pp.
136
143
.
13.
Gadgil
,
P. N.
, 1993, “
Optimization of a Stagnation Point Flow Reactor Design for Metalorganic Chemical Vapor Deposition by Flow Visualization
,”
J. Cryst. Growth
0022-0248,
134
(
3–4
), pp.
302
312
.
14.
Gadgil
,
P. N.
, 1993, “
Single Wafer Processing in Stagnation Point Flow CVD Reactor: Prospects, Constraints and Reactor Design
,”
J. Electron. Mater.
0361-5235,
22
(
2
), pp.
171
177
.
15.
Dandy
,
D. S.
, and
Yun
,
J.
, 1997, “
Momentum and Thermal Boundary-Layer Thickness in a Stagnation Flow Chemical Vapor Deposition Reactor
,”
J. Mater. Res.
0884-2914,
12
(
04
), pp.
1112
1121
.
16.
Joye
,
D. D.
, 1996, “
Design Criterion for the Heat-Transfer Coefficient in Opposing Flow, Mixed Convection Heat Transfer in a Vertical Tube
,”
Ind. Eng. Chem. Res.
0888-5885,
35
(
7
), pp.
2399
2403
.
17.
Zhou
,
D. W.
, and
Lee
,
S.
, 2007, “
Forced Convective Heat Transfer With Impinging Rectangular Jets
,”
Int. J. Heat Mass Transfer
0017-9310,
50
(
9–10
), pp.
1916
1926
.
You do not currently have access to this content.