In recent years, the Boltzmann transport equation (BTE) has begun to be used for predicting thermal transport in dielectrics and semiconductors at the submicron scale. However, most published studies make a gray assumption and do not account for either dispersion or polarization. In this study, we propose a model based on the BTE, accounting for transverse acoustic and longitudinal acoustic phonons as well as optical phonons. This model incorporates realistic phonon dispersion curves for silicon. The interactions among the different phonon branches and different phonon frequencies are considered, and the proposed model satisfies energy conservation. Frequency-dependent relaxation times, obtained from perturbation theory, and accounting for phonon interaction rules, are used. In the present study, the BTE is numerically solved using a structured finite volume approach. For a problem involving a film with two boundaries at different temperatures, the numerical results match the analogous exact solutions from radiative transport literature for various acoustic thicknesses. For the same problem, the transient thermal response in the acoustically thick limit matches results from the solution to the parabolic Fourier diffusion equation. In the acoustically thick limit, the bulk experimental value of thermal conductivity of silicon at different temperatures is recovered from the model. Experimental in-plane thermal conductivity data for silicon thin films over a wide range of temperatures are also matched satisfactorily.
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Submicron Heat Transport Model in Silicon Accounting for Phonon Dispersion and Polarization
Sreekant V. J. Narumanchi,
Sreekant V. J. Narumanchi
National Revewable Energy Laboratory, 1617 Cole Boulevard, Golden, CO 80401
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Jayathi Y. Murthy,
Jayathi Y. Murthy
School of Mechanical Engineering, Purdue University, 585 Purdue Mall, West Lafayette, IN 47907
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Cristina H. Amon
Cristina H. Amon
Institute for Complex Engineered Systems and Department of Mechanical Engineering, Carnegie Mellon University, 5000 Forbes Avenue, Pittsburgh, PA 15213
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Sreekant V. J. Narumanchi
National Revewable Energy Laboratory, 1617 Cole Boulevard, Golden, CO 80401
Jayathi Y. Murthy
School of Mechanical Engineering, Purdue University, 585 Purdue Mall, West Lafayette, IN 47907
Cristina H. Amon
Institute for Complex Engineered Systems and Department of Mechanical Engineering, Carnegie Mellon University, 5000 Forbes Avenue, Pittsburgh, PA 15213
Contributed by the Heat Transfer Division for publication in the JOURNAL OF HEAT TRANSFER. Manuscript received by the Heat Transfer Division August 4, 2003; revision received September 28, 2004. Associate Editor: G. Chen.
J. Heat Transfer. Dec 2004, 126(6): 946-955 (10 pages)
Published Online: January 26, 2005
Article history
Received:
August 4, 2003
Revised:
September 28, 2004
Online:
January 26, 2005
Citation
Narumanchi, S. V. J., Murthy, J. Y., and Amon, C. H. (January 26, 2005). "Submicron Heat Transport Model in Silicon Accounting for Phonon Dispersion and Polarization ." ASME. J. Heat Transfer. December 2004; 126(6): 946–955. https://doi.org/10.1115/1.1833367
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