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Research Papers

Nonlinear Large Deflection of Thin Film Overhung on Compliant Substrate Using Shaft-Loaded Blister Test

[+] Author and Article Information
Luyi Feng, Tielin Shi

State Key Laboratory of Digital Manufacturing
Equipment and Technology,
School of Mechanical Science and Engineering,
Huazhong University of Science and Technology,
Wuhan 430074, China

Xiwen Li

State Key Laboratory of Digital Manufacturing
Equipment and Technology,
School of Mechanical Science and Engineering,
Huazhong University of Science and Technology,
Wuhan 430074, China
e-mail: lxwhust2005@163.com

1Corresponding author.

Contributed by the Applied Mechanics Division of ASME for publication in the JOURNAL OF APPLIED MECHANICS. Manuscript received February 12, 2015; final manuscript received May 27, 2015; published online June 16, 2015. Assoc. Editor: Taher Saif.

J. Appl. Mech 82(9), 091001 (Sep 01, 2015) (9 pages) Paper No: JAM-15-1080; doi: 10.1115/1.4030739 History: Received February 12, 2015; Revised May 27, 2015; Online June 16, 2015

This paper presents the nonlinear large deflection of the thin film and the effect of substrate deformation on the thin film deflection through the shaft-loaded blister test. The blister of thin film can be divided into two parts, namely, the annular contact brim and the central noncontact bulge. A two-coupled line spring model is developed to describe the deformation of the contact part, and Föppl–Hencky equations are employed to study the constitutive relation between the applied load and the central deflection. The analytical and numerical solutions for the constitutive relation between the applied load and the deflection of thin film with considering the deformation of substrate are derived.

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Figures

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Fig. 1

Schematics of blister test: (a) a shaft-loaded blister configuration and (b) coupled-spring model of interface between thin film and substrate

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Fig. 2

The dimension and finite-element mesh of analog spring model

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Fig. 3

The compliance CNN versus parameters a/h and α

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Fig. 4

The compliance CQQ versus parameters a/h and α

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Fig. 5

The relations between ϕm and νf for different η

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Fig. 6

The relations between g and νf for different η

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Fig. 7

The relations between W0 and P for different η at νf = 0.3

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Fig. 8

The relations between W0 and P for different νf at η = 5

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