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BRIEF NOTES

In-Plane Gravity Loading of a Circular Membrane

[+] Author and Article Information
R. O. Tejeda, E. G. Lovell, R. L. Engelstad

Department of Mechanical Engineering, University of Wisconsin-Madison, Madison, WI 53706-1572

J. Appl. Mech 67(4), 837-839 (May 05, 2000) (3 pages) doi:10.1115/1.1308581 History: Received April 28, 1999; Revised May 05, 2000
Copyright © 2000 by ASME
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References

Gross,  G., 1997, “Ion Projection Lithography: Next Generation Technology?,” J. Vac. Sci. Technol., B15, No. 6, pp. 2136–2138.
Tejeda,  R., Engelstad,  R., Lovell,  E., and Berry,  I., 1998, “Analysis, Design, and Optimization of Ion-Beam Lithography Masks,” Proc. SPIE, Emerging Lithographic Technologies II, 3331, pp. 621–628.
Michell,  J. H., 1899, “On the Direct Determination of Stress in an Elastic Solid, With Application to the Theory of Plates,” Proc. London Math. Soc., 31, pp. 100–124.
Timoshenko, S. P., and Goodier, J. N., 1970, Theory of Elasticity, 3rd Ed., McGraw-Hill, New York, pp. 132–135.

Figures

Grahic Jump Location
In-plane gravity loading of a circular membrane
Grahic Jump Location
Radial displacement contours. Range is ±ρg(1−ν2)R2/E(3−ν).
Grahic Jump Location
Circumferential displacement contours. Range is ±ρg(1−ν2)R2/E(3−ν).

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